General description

Three stainless steel process chambers  (PM1, PM2 and PM3) host each 3 water cooled cathodes

• • PM1 chamber is used for the deposition of conductive materials, using a cathode mounting a 3” diameter target and 2 cathodes mounting a 2” target
  • PM2 chamber has 3 cathodes with 3” targets, and it is used for the deposition of insulating materials
  • PM3 chamber has 3 cathodes with 3″ targets and it is used for the deposition of magnetic materials 
• mass flow controllers for process gases (Ar, N2, O2)
• load lock could host samples up to 6” diameter, that can be automatically transferred to the PM1, PM2 and PM3 (or from one chamber to the other)
• equipped with a 16mc/h oil rotary pump and a 150 l/s turbomolecular pump.The vacuum level is measured by a Full Range sensor (from atmospheric pressure down to 5x10-10mbar)

Equipment name and Company: KS 300 C / Kenosistec

Technical specification

• materials commonly deposited: Ag/Al/Au/Cu/Ti/Ta/Pt and ZnO
• deposition of insulating materials.
• Magnetic materials.