Description

Two-photon polymerization as a direct laser writing technique allows for creating complex three-dimensional structures down to feature sizes on the order of 100 nm. Key elements of two-photon polymerization are lasers providing femtosecond pulses, suitable photosensitive materials (photoresists), a precise positioning stage and a computer to control the procedure.

Technical specification

• Optical system
  • Laser       773 nm, FWHM 8 nm, 132 fs, 80 MHz, 500 mW
  • Objective 1                             100 x immersion oil, NA 1,4
  • Objective 2                        20 x, NA 0,5
  • Objective 3                             50 x, NA 0,8
• Focusing                                manual
• Nanopositioning stages:
  • Lateral resolution (X, Y) 100 nm or better (objective 1)
  • Vertical resolution (Z) 500 nm or better (objective 1)
  • Typical processing speed 0.1 – 10 mm/s
  • Maximum axis speed (X, Y) 300 mm/s
  • Maximum axis speed (Z) 2000 mm/s
  • Laser Scanner Galvano Scanner
  • Writing area (X, Y) 100 mm x 100 mm
  • Resolution (X,Y) 4 nm or better
  • Travel range (Z) 100 mm
  • Structuring height (Z) 2 mm (objective 2)
  • Overall accuracy (X, Y, Z) ±200 nm
  • Repeatability (X, Y) ±50 nm
  • Repeatability (Z) ±100 nm
• Materials: works well with the proprietary Femtobond resin. Other photopolymerizable materials to be tested
• The printer works with *.STL geometry files