General Description
The DWL 66+is a high-resolution imaging system developed to expose on substrates with a photoresist coating.
The system is equipped with one exposure laser. The exposure laser is a 375 nm ultraviolet laser diode.
An environmental chamber ensures a temperature and humidity stable environment during operation.
The system is delivered with the necessary software to convert design data, execute applications, and control the system.
The conversion software converts external file formats, such as DXF or GDS, into a machine-readable format. The machine-readable format is optimized for rapid processing by the system.
The control software implements a graphical user interface, allows to control and monitor the system and to set up and execute the applications.
The system is delivered with two write heads that can be exchanged for different resolutions.
The system supports the advanced grayscale exposure mode. The advanced grayscale exposure mode enables the system to write complex topographies for micro-optical components or other grayscale applications.
Equipment name and Company: LASER WRITER DWL 66+ / Heidelberg Instruments Mikrotechnik GmbH
Technical specification
Write Mode III:
- Minimum Structure Size 1 um
- Minimum Lines & Spaces 1.5 um
- address grid 50 nm
- Edge Roughness 80 nm
- CD uniformity 130 nm
- 2° Layer Alignment Over 5 x 5 mm^2 250 nm
- 2° Layer Alignment Over 100 x 100 mm^2 350 nm
Write Mode HiRes:
- Minimum Structure Size 300 nm
- Minimum Lines & Spaces 500 nm
- Address grid 5 nm
- Edge Roughness 50 nm
- CD uniformity 60 nm
- 2° Layer Alignment Over 5 x 5 mm^2 250 nm
- 2° Layer Alignment Over 100 x 100 mm^2 350 nm