Description

The graphene CVD is a tool dedicated to the deposition of high quality graphene over large areas, by means of gas precursors in a CVD reactor.

Technical specification

Deposition of Single Layer Graphene on metallic substrates (mainly copper) is performed with a Low-Pressure cold wall Chemical Vapor Deposition equipment (nanoCVD, Moorfield Nanotechnology, UK).

The main characteristics are:

• H2 and Ar as operation gases, CH4 as carbon feedstock, N2 as service gas
• 1100 °C heater
• 2cm x 3cm uniform heating surface
• low thermal inertia, i.e. fast processes (growth process < 30 minutes)
• operation both in gas flux control and in pressure control
• low pressure operation: base pressure lower than 0.01 Torr, operating pressure 1-10 Torr (Ar/H2/CH4 mixture)
• deposition controlled by a multi-setpoint programmable software
• the equipment can be used also for carbon nanotube deposition