General description

The Stereomicroscope provides high-contrast 3D optical visualization with a long working distance and broad field of view. Designed for fast and non-destructive inspection, it delivers enhanced depth perception, high resolution, and sharp contrast across the entire magnification range. It is primarily used for rapid, non-destructive visual inspection, sample manipulation, defect analysis, and wafer quality control both prior to and following critical fabrication steps such as photolithography, etching, and thin-film deposition.

Equipment name and Company: Zeiss SteREO Discovery.V12

Technical specification

• Magnification Range: Standard optical zoom from 8x to 100x
• Working Distance: Long working distance (up to 134 mm depending on objective lens) for comfortable specimen manipulation and probing
• Illumination Systems: coaxial light and dual.-arm optical fibers
• Digital Imaging & Camera: Integrated high-resolution digital camera connected to ZEISS ZEN software suite for 2D image capture, multi-focus stacking (extended depth of field), and calibrated dimensional measurements
• Stage & Substrate Support: Large manual XY stage suitable for semiconductor wafers (up to 150 mm / 200 mm), glass substrates, MEMS dies, and custom samples