General Description
The Elionix ELS-BODEN 50F is a 50kV electron beam lithography (EBL) system designed for high-resolution nanoscale device fabrication. It runs on the newer ELMS software, which provides a comprehensive job scheduling, SEM, and diagnostics interface on a Windows 11 platform, including Python scripting support for custom workflows.
Key specifications include a minimum line width of less than 10 nm, a maximum beam current of 100 nA, and a high beam scan speed of 100 MHz, enabling greater pixel density and throughput. It can accommodate specimens up to 8-inch wafers or 7-inch masks, with a stitching accuracy of 15 nm and an overlay accuracy of 20 nm. The system also features dual-beam capability, which shortens dwell times during pattern writing.
Compared to other Elionix tools, the 50F’s relatively lower accelerating voltage (50kV, versus 100–150kV systems) trades some ultra-fine resolution for faster, high-throughput patterning, with a large 1000μm write-field well suited to research applications needing both speed and a generous patterning area.
Equipment name and Company: ELS-BODEN 50F / Elionix
Technical specification
- Accelerating voltage: 50 kV
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Write-field size: 1000 μm
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Minimum line width: less than 10 nm
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Maximum beam current: 100 nA
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Beam scan speed: 100 MHz
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Maximum specimen size: 8-inch wafers or 7-inch masks
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Stitching accuracy: 15 nm
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Overlay accuracy: 20 nm
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Beam configuration: dual-beam capability for shorter dwell-times and pattern writing