Description

The UV-exposure system is a tool used to carry out large-area flood exposures on the wafer-level. It is based on high-power LEDs and high-quality homogenization optics, allowing quasi-collimated optical beams. Due to its ease of use and rapid power on-off  switching (no need to wait for lamp heating/cooling and intensity stabilisation), it is also used, along with a home-made simple optical-mask press, for photolithography transfer of micrometric matterns (resolution > 5 microns).

This product line finds application in photoresist exposure (UV-LED photolithography and curing) and is suitable for a wide variety of substrates and photoresists used in MEMS, microfluidics, photonics, semiconductors and photovoltaic applications.

Equipment name and Company: — / Idonus

 Technical specification

• exposure area: 5″ wafers (15 cm diameter)
  
• UV illumination wavelength: 365 nm (quasi i-line)
  
• Dose and irradiance real-time monitoring for precise control of the delivered optical energy