Description

The benches are for: fluorinated substances, inorganic acids, inorganic bases and lift-off, chemical synthesis and organic solvent cleaning.  

Within the first, the available processes are:

i) HF wet etch;

ii) RCA3 (diluted HF);

BOE (buffer HF) solutions.

Within the second, the available processes are:

i) HCl wet etch;

ii) RCA1 (HCl + H2O2);

iii) Piranha (H2SO4 + H2O2) solutions.

Within the third, the available processes are: 

i) NaOH, KOH and TMAH wet etch;

ii) RCA2 (NH4OH + H2O2).

Within the fourth lift-off processes are mainly devoted to Al, Al2O3, Cu, Cr, Au. 

In principle, any kind of material synthesis (especially sol-gel synthesis) can be performed in this chemical hood, however the consultation with the area referent is mandatory.