Scanning Electron Microscope/Focused Ion Beam (SEM/FIB)

Description

A Dual Beam SEM-FIB (Scanning Electron Microscope-Focused Ion Beam) is a powerful instrument used in materials science and nanotechnology. It combines a traditional thermal emission scanning electron microscope (SEM) with a focused ion beam (FIB), offering a comprehensive suite of capabilities. This combination allows for high-resolution imaging, precise material removal or modification using focused ion beams, TEM sample preparation (TEM Lamella), observations in 2D, cross-section imaging to explore the subsurface of specimens, and structural modification of sample surfaces at the micrometer to nanometer scale. The machine features three different vacuum modes (High Vacuum, Low Vacuum & Environmental Modes), which accommodates the widest range of samples for SEM analysis. This tool is indispensable for studying the microstructure, composition, and properties of various materials at the nanoscale level, enabling researchers to investigate a diverse array of materials and phenomena across fields such as semiconductor technology, materials engineering, and biological sciences.

 

Technical specification

  • Max sample dimension: W 50 mm x D 50 mm x H 25 mm. These dimensions are valid for top-view imaging, some restrictions may apply in cross-section imaging.
  • Working temperature: Room Temperature
  • Pressure range:
    • High vacuum: < 6x10^-4 Pa;
    • Low vacuum: 10 Pa – 130 Pa;
    • ESEM – vacuum: 10 Pa – 4000 Pa
  • E-gun source: Schottky-emitter electron source always ON tungsten tip ZrO2 covered.
  • FIB gun source: Ga liquid metal
  • Operating HT: 1kV~30kV
  • Detectors and Attachments:
    • Everhardt-Thornley SEDLow-vacuum SED (used in low vacuum)
    • Gaseous SED (GSED) (used in ESEM mode)
    • Solid-State BSED
  • Electron beam resolution:
    • High-vacuum
      • 1.2 nm at 30 kV (SE)
      • 2.5 nm at 30 kV (BSE)
      • 2.9 nm at 1 kV (SE)
    • Low-vacuum
      • 1.5 nm at 30 kV (SE)
      • 2.5 nm at 30 kV (BSE)
      • 2.9 nm at 3 kV (SE)
    • Extended low-vacuum mode (ESEM)
      • 1.5 nm at 30 kV (SE)
  • Focus Ion Beam resolution:7 nm at 30 kV at beam coincident point
  • Gas Injection Systems:
    • Pt
    • Carbon
    • XeF2