Equipment name and Company: TFS 200 / BeneQ

Technical specification

• single wafer reaction chamber
• highly modular structure for research purpouses
• deposition of Al2O3, TiO2, ZnO, and Al-doped ZnO (AZO) (liquid source) and Ta2O5 (hot source) thin layers
• uniformity of deposition guaranteed also on high aspect-ratio structures
• three room-temperature liquid sources, one hot source with two interchangeable precursor containers (for liquid and solid precursor materials which need heating to reach sufficient vapor pressure, up to 300°C)
• ozone gas line, which allows the deposition of other types of materials, such as Fe oxides (hematite, magnetite).