Description

The RTP is a tool equipped with rapid heating and cooling, designed to reach more than 1000°C for annealing of materials and doping substrates under controlled atmosphere. 

Technical specification

• The Solaris 100 can process up to 101.6mm (4″) substrates at a temperature range from RT up to 1250°C
• Unique PID process controller that ensures accurate temperature stability and uniformity
• The system can accommodate four interlocked MFCs for gas mixing and forming gas processing
• To date, O2 and N2 lines are available