Facilities, Services and Trainings
Reference for quantum, micro and nano technologies
- Qualified personnel of INRiM, Politecnico di Torino e Università degli Studi di Torino;
- Design, fabrication, and characterization of quantum metrology devices;
- Growth, characterization, and processing of micro and nanoscale materials for the fabrication of MEMS, microsensors, and Lab-On-Chip.
Services
- Infrastructure access and training;
- Support to the development of new micro and nanostructured materials;
- Support to the measurement and characterization of devices for on-demand applications;
- Support for the design and development of functional devices and components.
Access mode
- Services provided by internal staff;
- Autonomous or assisted use.
Clean room access trainings
To access the PiQuET facility is mandatory to attend the access training.
INRiM, PoliTo, and UniTo personnel have to fill out the form to the right to pre-book their participation. Two weeks before the training date, the possibility of booking will be disabled. The PiQuET Staff will ask for your confirmation of participation before the training.
People who do not belong to INRiM, PoliTo, and UniTo, please send an e-mail to info@piquetlab.it.
Lab N01: “Q-Tech - Quantum devices”
Class: ISO6
Area: 70 m2
Aim: Characterization of Quantum Photonic Devices. Q-comm Trusted Node – Superconductive Detector, Availability of an Optical Cryostat
Lab N02: “Microscopy and Electron- and Ion- Beam Lithography”
Class: ISO6
Area: 68 m2
Aim: Characterization of nanostructures and devices
Lab N03: “Etching, growth, thermal treatment”
Class: ISO6
Area: 65 m2
Aim: Growth, heat treatment and layer removal by physical etching.
Lab N04a: “Packaging”
Class: ISO7
Area: 23 m2
Aim: Assembly and packaging of devices.
Lab N04b: “Deposition”
Class: IS06
Area: 51 m2
Aim: Physical deposition of thin films.
Lab N05b: “Chemical”
Class: ISO6
Area: 26 m2
Aim: Cleaning and preparation of substrates, nanostructured materials synthesis.
Lab N05b: “Optical Lithography”
Class: ISO5
Area: 32 m2
Aim: Optical lithography.
Lab N06b: “Lab TEM”
Class: –
Area: 15 m2
Aim: TEM analysis.